Deposition method for a passivation layer of a fluid ejection device
In one embodiment of the present invention, a passivation layer of a fluid ejection device is formed by an atomic layer epitaxy process.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | In one embodiment of the present invention, a passivation layer of a fluid ejection device is formed by an atomic layer epitaxy process. |
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