Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Loopstra, Erik, Franken, Dominicus, Smits, Josephus, Van Dijsseldonk, Antonius, Moors, Johannes, Hof, Albrecht, Maul, Gunter, Muhlbeyer, Michael, Mehlkopp, Klaus
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10 −6 K −1 .