Compounds for forming alumina films using chemical vapor deposition method and process for preparing the compound
Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic compounds and methods of forming aluminum films.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organometallic compounds and methods of forming aluminum films. |
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