CENTRIFUGE AND METHOD FOR CENTRIFUGING A SEMICONDUCTOR WAFER

CENTRIFUGE AND METHOD FOR CENTRIFUGING A SEMICONDUCTOR WAFER

A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates...

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Bibliographische Detailangaben
Hauptverfasser: HOHL, GEORG-FRIEDRICH, BRUNNER, ROLAND, BAUER-MAYER, SUSANNE, BRUNNER, GUNTHER, LUTHE, HANS-JOACHIM, SOLLINGER, FRANZ
Format: Patent
Sprache:eng
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Zusammenfassung:A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.