Method for producing article coated with patterned film and photosensitive composition

There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light. and has excellent pattern accuracy; and a photosensitive composition. The meth...

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Bibliographische Detailangaben

Hauptverfasser:	Tatsumisago, Masahiro, Minami, Tsutomu, Tadanaga, Kiyoharu, Matsuda, Atsunori, Kawadu, Mitsuhiro, Nakamura, Koichiro, Yamamoto, Hiroaki
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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