Apparatus for applying thin layers to a substrate

A process gas source ( 16 ) is connected to the vacuum chamber ( 5 ), and a metering valve ( 12 ) actuated by an automatic controller is installed between the vacuum chamber ( 5 ) and the process gas source ( 16 ). A potentiometric measurement electrode compares the amount of a gas in the vacuum cha...

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Bibliographische Detailangaben
Hauptverfasser: Teschner, Gotz, Szczyrbowski, Joachim, Bruch, Jurgen
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A process gas source ( 16 ) is connected to the vacuum chamber ( 5 ), and a metering valve ( 12 ) actuated by an automatic controller is installed between the vacuum chamber ( 5 ) and the process gas source ( 16 ). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber ( 5 ) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit ( 14 ), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas.