Apparatus for applying thin layers to a substrate
A process gas source ( 16 ) is connected to the vacuum chamber ( 5 ), and a metering valve ( 12 ) actuated by an automatic controller is installed between the vacuum chamber ( 5 ) and the process gas source ( 16 ). A potentiometric measurement electrode compares the amount of a gas in the vacuum cha...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A process gas source (
16
) is connected to the vacuum chamber (
5
), and a metering valve (
12
) actuated by an automatic controller is installed between the vacuum chamber (
5
) and the process gas source (
16
). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber (
5
) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit (
14
), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas. |
---|