Dual-member pellicle assemblies and methods of use

Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths either within or outside the visible spectrum include a pellicle that is removed during exposure. The pellicle sheet can be transparent or opaque. In one embodiment, a pellicle assembly comprises a base member aligned with a photomask, and an upper member in the form of a pellicle frame coupled to a pellicle sheet. The pellicle frame can be removed from the exposure path. When overlying the base member, the pellicle frame can be secured to it with a securing mechanism such as magnets, mating bevels, or mating male and female members. Detaching and handling elements, such as handles and/or recesses, can be provided to detach the pellicle frame from the base member and/or to move the pellicle assembly. Methods of using a pellicle assembly are also described.