Method of preparing a slurry for monitoring particle size distribution

Method of preparing a slurry for monitoring particle size distribution

Provided is a process of preparing a slurry sample containing abrasive particles useful in CMP for observation with a scanning electron microscope in order to monitor particle size distribution. The process comprises providing a slurry sample containing abrasive particles useful in CMP, and placing...

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Bibliographische Detailangaben
1. Verfasser: Tarutani, Kohei
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided is a process of preparing a slurry sample containing abrasive particles useful in CMP for observation with a scanning electron microscope in order to monitor particle size distribution. The process comprises providing a slurry sample containing abrasive particles useful in CMP, and placing a sample of the slurry on an iso-pore filter to thereby remove liquid from the slurry.