Semiconductor device and manufacturing method of the semiconductor device

The package size of a diode is made smaller. On the element forming face of a semiconductor substrate having a p − -type conductive type, after a hyper-abrupt p + n + junction of a p + -type diffusion layer, an n + -type hyper-abrupt layer, an n − -epitaxial layer, an n-type low resistance layer and...

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Bibliographische Detailangaben
Hauptverfasser: Suzuki, Shuichi, Nagase, Hiroyuki, Otoguro, Masaki, Ichinose, Yasuharu, Mitsuyasu, Teruhiro
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The package size of a diode is made smaller. On the element forming face of a semiconductor substrate having a p − -type conductive type, after a hyper-abrupt p + n + junction of a p + -type diffusion layer, an n + -type hyper-abrupt layer, an n − -epitaxial layer, an n-type low resistance layer and an n + -type diffusion layer is formed, an anode electrode is formed on the top of the p + -type diffusion layer and a cathode electrode is formed on the top of the n + -type diffusion layer. Thereafter, electrode bumps are formed on the top of the anode electrode and the cathode electrode to thereby manufacture a small diode that can be facedown bonded onto a mounting board.