Projection exposure device
A projection exposure device ( 1 ), in particular for micro-lithography, serves to produce an image of an object ( 2 ) in an image plane ( 11 ) positioned in an object plane ( 10 ). For this reason the projection exposure device ( 1 ) has a radiation source ( 4 ) emitting projection radiation ( 5 )....
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A projection exposure device (
1
), in particular for micro-lithography, serves to produce an image of an object (
2
) in an image plane (
11
) positioned in an object plane (
10
). For this reason the projection exposure device (
1
) has a radiation source (
4
) emitting projection radiation (
5
). Illumination optics (
6
) are positioned between the radiation source (
4
) and the object plane (
10
) and projection optics (
8
) are positioned between the object plane (
10
) and the image plane (
11
). A detection device (
30
) is provided to measure the illumination angle distribution of the projection radiation (
5
) in a field plane (
10
). This communicates via at least one control device (
34, 18
) with at least one manipulator (
20, 45, 47
). The latter serves to move at least one optical component (
7, 41
) within the projection ray path (
5, 9
). The illumination angle distribution changes as a result of the controlled movement of the optical component (
7, 41
). This can therefore be adjusted depending on the measurement result and for example adapted to the object structure. |
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