ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD

An electrostatic chuck 55 comprises an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive a substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. The base 175 comprises a composite of a plurali...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SHAMOUILIAN, SHAMOUIL, KUMAR, ANANDA H, KHOLODENKO, ARNOLD, WANG, YOU, VEYTSER, ALEXANDER M, BEDI, SURINDER S, NARENDRNATH, KADTHALA R, KATS, SEMYON L, GRIMARD, DENNIS S, CHENG, WING L
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SHAMOUILIAN, SHAMOUIL
KUMAR, ANANDA H
KHOLODENKO, ARNOLD
WANG, YOU
VEYTSER, ALEXANDER M
BEDI, SURINDER S
NARENDRNATH, KADTHALA R
KATS, SEMYON L
GRIMARD, DENNIS S
CHENG, WING L
description An electrostatic chuck 55 comprises an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive a substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. The base 175 comprises a composite of a plurality of materials, such as, ceramic and metal, for example silicon carbide and aluminum. Optionally, a support 190 can be provided to support the base 175.
format Patent
fullrecord <record><control><sourceid>uspatents_EFI</sourceid><recordid>TN_cdi_uspatents_applications_20020036881</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>20020036881</sourcerecordid><originalsourceid>FETCH-uspatents_applications_200200368813</originalsourceid><addsrcrecordid>eNrjZDBx9XF1DgnyDw5xDPF0VnD2CHX2VvBwDPP0c1dw9vcN8A_2DHFVcHIMdlVw9HNR8HUN8fB34WFgTUvMKU7lhdLcDJpuriHOHrqlxQWJJal5JcXxiQUFOZnJiSWZ-XnF8UYGBkBkbGZhYWhMiloA0UYuSg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD</title><source>USPTO Published Applications</source><creator>SHAMOUILIAN, SHAMOUIL ; KUMAR, ANANDA H ; KHOLODENKO, ARNOLD ; WANG, YOU ; VEYTSER, ALEXANDER M ; BEDI, SURINDER S ; NARENDRNATH, KADTHALA R ; KATS, SEMYON L ; GRIMARD, DENNIS S ; CHENG, WING L</creator><creatorcontrib>SHAMOUILIAN, SHAMOUIL ; KUMAR, ANANDA H ; KHOLODENKO, ARNOLD ; WANG, YOU ; VEYTSER, ALEXANDER M ; BEDI, SURINDER S ; NARENDRNATH, KADTHALA R ; KATS, SEMYON L ; GRIMARD, DENNIS S ; CHENG, WING L</creatorcontrib><description>An electrostatic chuck 55 comprises an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive a substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. The base 175 comprises a composite of a plurality of materials, such as, ceramic and metal, for example silicon carbide and aluminum. Optionally, a support 190 can be provided to support the base 175.</description><language>eng</language><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20020036881$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,873,885,64057</link.rule.ids><linktorsrc>$$Uhttps://patentcenter.uspto.gov/applications/09306934$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHAMOUILIAN, SHAMOUIL</creatorcontrib><creatorcontrib>KUMAR, ANANDA H</creatorcontrib><creatorcontrib>KHOLODENKO, ARNOLD</creatorcontrib><creatorcontrib>WANG, YOU</creatorcontrib><creatorcontrib>VEYTSER, ALEXANDER M</creatorcontrib><creatorcontrib>BEDI, SURINDER S</creatorcontrib><creatorcontrib>NARENDRNATH, KADTHALA R</creatorcontrib><creatorcontrib>KATS, SEMYON L</creatorcontrib><creatorcontrib>GRIMARD, DENNIS S</creatorcontrib><creatorcontrib>CHENG, WING L</creatorcontrib><title>ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD</title><description>An electrostatic chuck 55 comprises an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive a substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. The base 175 comprises a composite of a plurality of materials, such as, ceramic and metal, for example silicon carbide and aluminum. Optionally, a support 190 can be provided to support the base 175.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EFI</sourceid><recordid>eNrjZDBx9XF1DgnyDw5xDPF0VnD2CHX2VvBwDPP0c1dw9vcN8A_2DHFVcHIMdlVw9HNR8HUN8fB34WFgTUvMKU7lhdLcDJpuriHOHrqlxQWJJal5JcXxiQUFOZnJiSWZ-XnF8UYGBkBkbGZhYWhMiloA0UYuSg</recordid><startdate>20020328</startdate><enddate>20020328</enddate><creator>SHAMOUILIAN, SHAMOUIL</creator><creator>KUMAR, ANANDA H</creator><creator>KHOLODENKO, ARNOLD</creator><creator>WANG, YOU</creator><creator>VEYTSER, ALEXANDER M</creator><creator>BEDI, SURINDER S</creator><creator>NARENDRNATH, KADTHALA R</creator><creator>KATS, SEMYON L</creator><creator>GRIMARD, DENNIS S</creator><creator>CHENG, WING L</creator><scope>EFI</scope></search><sort><creationdate>20020328</creationdate><title>ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD</title><author>SHAMOUILIAN, SHAMOUIL ; KUMAR, ANANDA H ; KHOLODENKO, ARNOLD ; WANG, YOU ; VEYTSER, ALEXANDER M ; BEDI, SURINDER S ; NARENDRNATH, KADTHALA R ; KATS, SEMYON L ; GRIMARD, DENNIS S ; CHENG, WING L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_applications_200200368813</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>SHAMOUILIAN, SHAMOUIL</creatorcontrib><creatorcontrib>KUMAR, ANANDA H</creatorcontrib><creatorcontrib>KHOLODENKO, ARNOLD</creatorcontrib><creatorcontrib>WANG, YOU</creatorcontrib><creatorcontrib>VEYTSER, ALEXANDER M</creatorcontrib><creatorcontrib>BEDI, SURINDER S</creatorcontrib><creatorcontrib>NARENDRNATH, KADTHALA R</creatorcontrib><creatorcontrib>KATS, SEMYON L</creatorcontrib><creatorcontrib>GRIMARD, DENNIS S</creatorcontrib><creatorcontrib>CHENG, WING L</creatorcontrib><collection>USPTO Published Applications</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHAMOUILIAN, SHAMOUIL</au><au>KUMAR, ANANDA H</au><au>KHOLODENKO, ARNOLD</au><au>WANG, YOU</au><au>VEYTSER, ALEXANDER M</au><au>BEDI, SURINDER S</au><au>NARENDRNATH, KADTHALA R</au><au>KATS, SEMYON L</au><au>GRIMARD, DENNIS S</au><au>CHENG, WING L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD</title><date>2002-03-28</date><risdate>2002</risdate><abstract>An electrostatic chuck 55 comprises an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive a substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. The base 175 comprises a composite of a plurality of materials, such as, ceramic and metal, for example silicon carbide and aluminum. Optionally, a support 190 can be provided to support the base 175.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_uspatents_applications_20020036881
source USPTO Published Applications
title ELECTROSTATIC CHUCK HAVING COMPOSITE BASE AND METHOD
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T13%3A00%3A50IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFI&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SHAMOUILIAN,%20SHAMOUIL&rft.date=2002-03-28&rft_id=info:doi/&rft_dat=%3Cuspatents_EFI%3E20020036881%3C/uspatents_EFI%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true