PROCESS CHAMBER HAVING IMPROVED TEMPERATURE CONTROL

A temperature control system 145 is used to control the temperature of a process chamber 25 during processing of a semiconductor substrate 70 . The temperature control system 145 comprises a heat exchanger plate 155 for removing heat from the chamber 25 , and a heat transfer member 158 for conductin...

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Hauptverfasser: SHAMOUILIAN, SHAMOUIL, KUMAR, ANANDA H, NARENDRNATH, KADTHALA R, ASKARINAM, ERIC, WELDON, EDWIN C, RICE, MICHAEL, COLLINS, KENNETH S
Format: Patent
Sprache:eng
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