Simulation-Based Analysis on Operational Control of Batch Processors in Wafer Fabrication

[EN] In semiconductor wafer fabrication (wafer fab), wafers go through hundreds of process steps on a variety of processing machines for electrical circuit building operations. One of the special features in the wafer fabs is that there exist batch processors (BPs) where several wafer lots are processed at the same time as a batch. The batch processors have a significant influence on system performance because the repetitive batching and de-batching activities in a reentrant product flow system lead to non-smooth product flows with high variability. Existing research on the BP control problems has mostly focused on the local performance, such as waiting time at the BP stations. This paper attempts to examine how much BP control policies affect the system-wide behavior of the wafer fabs. A simulation model is constructed with which experiments are performed to analyze the performance of BP control rules under various production environments. Some meaningful insights on BP control decisions are identified through simulation results. This work was supported by the Pukyong National University Research Abroad Fund (C-D-2016-0843). Koo, P.; Ruiz García, R. (2020). Simulation-Based Analysis on Operational Control of Batch Processors in Wafer Fabrication. Applied Sciences. 10(17):1-17. https://doi.org/10.3390/app10175936 Wang, L.-C., Chu, P.-C., & Lin, S.-Y. (2019). Impact of capacity fluctuation on throughput performance for semiconductor wafer fabrication. Robotics and Computer-Integrated Manufacturing, 55, 208-216. doi:10.1016/j.rcim.2018.03.005 Ham, M. (2012). Integer programming-based real-time dispatching (i-RTD) heuristic for wet-etch station at wafer fabrication. International Journal of Production Research, 50(10), 2809-2822. doi:10.1080/00207543.2011.594816 Mathirajan, M., & Sivakumar, A. I. (2006). A literature review, classification and simple meta-analysis on scheduling of batch processors in semiconductor. The International Journal of Advanced Manufacturing Technology, 29(9-10), 990-1001. doi:10.1007/s00170-005-2585-1 FOWLER, J. W., HOGG, G. L., & PHILLIPS, D. T. (2000). Control of multiproduct bulk server diffusion/oxidation processes. Part 2: multiple servers. IIE Transactions, 32(2), 167-176. doi:10.1080/07408170008963889 Van Der Zee, D. J. (2002). Adaptive scheduling of batch servers in flow shops. International Journal of Production Research, 40(12), 2811-2833. doi:10.1080/00207540210136559 Wang, J., Zheng, P., & Zhang, J. (2020). Big data analy