Polaron absorption in amorphous tungsten oxide films

Amorphous thin films of tungsten oxide were deposited by sputtering onto glass substrates covered by conductive indium–tin oxide. The density and stoichiometry were determined by Rutherford backscattering spectrometry. Lithium ions were intercalated electrochemically into the films. The optical refl...

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Veröffentlicht in:Journal of applied physics 2001-08, Vol.90 (4), p.1860-1863
Hauptverfasser: Berggren, Lars, Azens, Andris, Niklasson, Gunnar A.
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Sprache:eng
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Zusammenfassung:Amorphous thin films of tungsten oxide were deposited by sputtering onto glass substrates covered by conductive indium–tin oxide. The density and stoichiometry were determined by Rutherford backscattering spectrometry. Lithium ions were intercalated electrochemically into the films. The optical reflectance and transmittance were measured in the wavelength range from 0.3 to 2.5 μm, at a number of intercalation levels. The polaron absorption peak becomes more symmetric and shifts to higher energies until an intercalation level of 0.25 to 0.3 Li+/W, where a saturation occurs. The shape of the polaron peak is in very good agreement with the theory of Bryksin [Fiz. Tverd. Tela 24, 1110 (1982)]. Within this model, the shift of the absorption peak is interpreted as an increase in the Fermi level of the material as more Li ions are inserted.
ISSN:0021-8979
1089-7550
1089-7550
DOI:10.1063/1.1384853