Unravelling the free electron behavior in InN

Precise measurement of the optical Hall effect in InN using magneto-optical generalized ellipsometry at IR and THz wavelengths, allows us to decouple the surface accumulation and bulk electron densities in InN films by non-contact optical means and further to precisely measure the effective mass and...

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Hauptverfasser: Darakchieva, V., Hofmann, T., Schubert, M., Sernelius, B.E., Giuliani, F., Xie, M.-Y., Persson, P.O.A., Monemar, B., Schaff, W.J., Hsiao, C.-L., Chen, L.-C., Nanishi, Y.
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:Precise measurement of the optical Hall effect in InN using magneto-optical generalized ellipsometry at IR and THz wavelengths, allows us to decouple the surface accumulation and bulk electron densities in InN films by non-contact optical means and further to precisely measure the effective mass and mobilities for polarizations parallel and perpendicular to the optical axis. Studies of InN films with different thicknesses, free electron densities and surface orientations enable an intricate picture of InN free electron properties to emerge. Striking findings on the scaling factors of the bulk electron densities with film thickness further supported by transmission electron microscopy point to an additional thickness dependent doping mechanism unrelated to dislocations. Surface electron accumulation is observed to occur not only at polar but also at non-polar and semi-polar wurtzite InN, and zinc blende InN surfaces. The persistent surface electron density shows a complex behavior with bulk density and surface orientation. This behavior might be exploited for tuning the surface charge in InN.
ISSN:1097-2137
2377-5505
DOI:10.1109/COMMAD.2008.4802099