Measurement of Micrometer Diffusion Lengths by Nuclear Spectrometry
A method for determination of diffusion lengths in the range 0.5-50 {mu}m, which corresponds to carrier lifetimes in the nanosecond range, is suggested A calibrated nonequilibrium charge is injected into the base of the reverse-biased diode structure. The injection is provided by alpha particles gen...
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Veröffentlicht in: | Semiconductors (Woodbury, N.Y.) N.Y.), 2005-01, Vol.39 (12), p.1394 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A method for determination of diffusion lengths in the range 0.5-50 {mu}m, which corresponds to carrier lifetimes in the nanosecond range, is suggested A calibrated nonequilibrium charge is injected into the base of the reverse-biased diode structure. The injection is provided by alpha particles generated by natural decay in the single-particle counting mode. The nuclear spectrometry technique is used to measure the amount of charge that diffused across the base to the boundary of the electric-field region. The loss of charge during the diffusion is calculated as a function of the depth of alpha particle penetration beyond the electric-field region. The derived power-law functions make it possible to relate the diffusion length with the exponent and numerical factor that describes the loss of charge. The experiment is performed with lightly doped 4H-SiC epitaxial films. |
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ISSN: | 1063-7826 1090-6479 1090-6479 |
DOI: | 10.1134/1.2140311 |