Measurement of Micrometer Diffusion Lengths by Nuclear Spectrometry

A method for determination of diffusion lengths in the range 0.5-50 {mu}m, which corresponds to carrier lifetimes in the nanosecond range, is suggested A calibrated nonequilibrium charge is injected into the base of the reverse-biased diode structure. The injection is provided by alpha particles gen...

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Veröffentlicht in:Semiconductors (Woodbury, N.Y.) N.Y.), 2005-01, Vol.39 (12), p.1394
1. Verfasser: Strokan, N. B.
Format: Artikel
Sprache:eng
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Zusammenfassung:A method for determination of diffusion lengths in the range 0.5-50 {mu}m, which corresponds to carrier lifetimes in the nanosecond range, is suggested A calibrated nonequilibrium charge is injected into the base of the reverse-biased diode structure. The injection is provided by alpha particles generated by natural decay in the single-particle counting mode. The nuclear spectrometry technique is used to measure the amount of charge that diffused across the base to the boundary of the electric-field region. The loss of charge during the diffusion is calculated as a function of the depth of alpha particle penetration beyond the electric-field region. The derived power-law functions make it possible to relate the diffusion length with the exponent and numerical factor that describes the loss of charge. The experiment is performed with lightly doped 4H-SiC epitaxial films.
ISSN:1063-7826
1090-6479
1090-6479
DOI:10.1134/1.2140311