Time-resolved optical properties of GaN grown by metalorganic vapor phase epitaxy with indium surfactant

The effects of isoelectronic indium doping on optical properties of GaN layers grown by metalorganic vapor-phase epitaxy have been studied. Two sets of samples have been grown with hydrogen and with nitrogen as carrier gas. It has been shown from scanning electron microscopy, cathodoluminescence and...

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Veröffentlicht in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2001-05, Vol.82 (1), p.137-139
Hauptverfasser: Pozina, G, Bergman, J.P, Monemar, B, Yamaguchi, S, Amano, H, Akasaki, I
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Sprache:eng
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Zusammenfassung:The effects of isoelectronic indium doping on optical properties of GaN layers grown by metalorganic vapor-phase epitaxy have been studied. Two sets of samples have been grown with hydrogen and with nitrogen as carrier gas. It has been shown from scanning electron microscopy, cathodoluminescence and time-resolved photoluminescence that In-doped samples have a lower dislocation density, a narrower photoluminescence line width and a longer free exciton lifetime. The improvements of structural and optical properties are attributed to the effect of In on dislocations.
ISSN:0921-5107
1873-4944
1873-4944
DOI:10.1016/S0921-5107(00)00714-5