Silicon carbonitride thin films deposited by reactive high power impulse magnetron sputtering

Silicon carbonitride thin films deposited by reactive high power impulse magnetron sputtering

Amorphous silicon carbonitride thin films for biomedical applications were deposited in an industrial coating unit from a silicon target in different argon/nitrogen/acetylene mixtures by reactive high power impulse magnetron sputtering (rHiPIMS). The effects of acetylene (C2H2) flow rate, substrate...

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Veröffentlicht in:Surface & coatings technology 2018-02, Vol.335, p.248-256
Hauptverfasser: Hänninen, Tuomas, Schmidt, Susann, Ivanov, Ivan G., Jensen, Jens, Hultman, Lars, Högberg, Hans
Format: Artikel
Sprache:eng
Schlagworte:
Acetylene
Amorphous silicon
Bias
Biomedical materials
Carbon
Compressive properties
Flow velocity
H/E
Hardness
Magnetron sputtering
Morphology
Nanoindentation
Nitrogen
Properties (attributes)
Residual stress
Scanning electron microscopy
Silicon
Silicon carbonitride
Silicon nitride
Substrates
Thin films
Voltammetry
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Zusammenfassung:Amorphous silicon carbonitride thin films for biomedical applications were deposited in an industrial coating unit from a silicon target in different argon/nitrogen/acetylene mixtures by reactive high power impulse magnetron sputtering (rHiPIMS). The effects of acetylene (C2H2) flow rate, substrate temperature, substrate bias voltage, and HiPIMS pulse frequency on the film properties were investigated. Low C2H2 flow rates (
ISSN:0257-8972
1879-3347
1879-3347
DOI:10.1016/j.surfcoat.2017.12.037