Chromium oxide-based multilayer coatings deposited by reactive magnetron sputtering in an industrial setup

Chromium oxide-based multilayers were deposited by reactive magnetron sputtering in an industrial setup by employing one-fold substrate rotation and cyclic variation of the O 2 flow. This simple method allows deposition of multilayers comprising alternating layers of ~ 1 μm thickness of columnar α-C...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Surface & coatings technology 2008-10, Vol.203 (1), p.156-159
Hauptverfasser:	Eklund, P., Mikkelsen, N.-J., Sillassen, M., Bienk, E.J., Bøttiger, J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chromium oxide Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metallic coatings Metals. Metallurgy Multilayer Physics Production techniques Reactive sputtering Rutherford backscattering spectroscopy Scanning electron microscopy (SEM) Surface treatment Surface treatments X-ray diffraction (XRD)
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Chromium oxide-based multilayers were deposited by reactive magnetron sputtering in an industrial setup by employing one-fold substrate rotation and cyclic variation of the O 2 flow. This simple method allows deposition of multilayers comprising alternating layers of ~ 1 μm thickness of columnar α-Cr 2O 3 and mixed layers consisting of ~ 50 nm-thick sublayers of amorphous CrO x and nanocrystalline Cr 2O 3.
ISSN:	0257-8972 1879-3347 1879-3347
DOI:	10.1016/j.surfcoat.2008.08.035