High reliability, high yield, high modulation bandwidth, low threshold current 1.55 μm MQW laser by new in-situ etching technique

For the first time, to our knowledge, an InP based Fabry-Perot MQW semiconductor laser is obtained by using an in-situ etching technique. Good static and dynamic laser characteristics together with high process yield and reliability confirm the validity of this new technological process.

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Bibliographische Detailangaben
Hauptverfasser: Bertone, Daniele, Campi, Roberta, Fang, Ruiyi yi, Meliga, Marina, Morello, G., Murgia, S., Paoletti, Roberto
Format: Tagungsbericht
Sprache:eng
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Beschreibung
Zusammenfassung:For the first time, to our knowledge, an InP based Fabry-Perot MQW semiconductor laser is obtained by using an in-situ etching technique. Good static and dynamic laser characteristics together with high process yield and reliability confirm the validity of this new technological process.
DOI:10.1109/ECOC.1998.732443