Crack-Defined Electronic Nanogaps

Achieving near‐atomic‐scale electronic nanogaps in a reliable and scalable manner will facilitate fundamental advances in molecular detection, plasmonics, and nanoelectronics. Here, a method is shown for realizing crack‐defined nanogaps separating TiN electrodes, allowing parallel and scalable fabri...

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Veröffentlicht in:	Advanced materials (Weinheim) 2016-03, Vol.28 (11), p.2178-2182
Hauptverfasser:	Dubois, Valentin, Niklaus, Frank, Stemme, Göran
Format:	Artikel
Sprache:	eng
Schlagworte:	Arrays crack junctions Electrodes electronic transport Electronics junctions large-scale molecular electronics Nanoelectronics nanogap electrodes nanogaps nanoplasmonics Nanostructure parallel fabrication Plasmonics tunnel junctions tunneling wafer-scale
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Beschreibung
Zusammenfassung:	Achieving near‐atomic‐scale electronic nanogaps in a reliable and scalable manner will facilitate fundamental advances in molecular detection, plasmonics, and nanoelectronics. Here, a method is shown for realizing crack‐defined nanogaps separating TiN electrodes, allowing parallel and scalable fabrication of arrays of sub‐10 nm electronic nanogaps featuring individually defined gap widths.
ISSN:	0935-9648 1521-4095 1521-4095
DOI:	10.1002/adma.201504569