Numerical Analysis of Wavefront Approximation Accuracy by Means of Zernike Polynomials for Optical Surface Flatness Measurements Using a Hartmannometer Device
A metrological device—Hartmannometer—based on a Shack-Hartmann wavefront sensor for measuring the flatness of optical surfaces was developed and researched, and the results were compared with the results obtained from measurements using a Fizeau interferometer. The paper presents a method for calibr...
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Veröffentlicht in: | Optical memory & neural networks 2024-12, Vol.33 (Suppl 1), p.S146-S157 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A metrological device—Hartmannometer—based on a Shack-Hartmann wavefront sensor for measuring the flatness of optical surfaces was developed and researched, and the results were compared with the results obtained from measurements using a Fizeau interferometer. The paper presents a method for calibrating a Hartmannometer, and also compares the results of measuring a test optical surface using the developed device and a classical Fizeau interferometer. The total amplitude of wavefront distortions measured using a Fizeau interferometer was 0.127 μm (standard deviation 0.022 μm). The Hartmannometer showed distortions amplitude of 0.131 µm (standard deviation 0.024 µm). |
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ISSN: | 1060-992X 1934-7898 |
DOI: | 10.3103/S1060992X24700395 |