Numerical Analysis of Wavefront Approximation Accuracy by Means of Zernike Polynomials for Optical Surface Flatness Measurements Using a Hartmannometer Device

A metrological device—Hartmannometer—based on a Shack-Hartmann wavefront sensor for measuring the flatness of optical surfaces was developed and researched, and the results were compared with the results obtained from measurements using a Fizeau interferometer. The paper presents a method for calibr...

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Veröffentlicht in:Optical memory & neural networks 2024-12, Vol.33 (Suppl 1), p.S146-S157
Hauptverfasser: Galaktionov, I. V., Nikitin, A. N., Sheldakova, J. V., Toporovsky, V. V., Kudryashov, A. V.
Format: Artikel
Sprache:eng
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Zusammenfassung:A metrological device—Hartmannometer—based on a Shack-Hartmann wavefront sensor for measuring the flatness of optical surfaces was developed and researched, and the results were compared with the results obtained from measurements using a Fizeau interferometer. The paper presents a method for calibrating a Hartmannometer, and also compares the results of measuring a test optical surface using the developed device and a classical Fizeau interferometer. The total amplitude of wavefront distortions measured using a Fizeau interferometer was 0.127 μm (standard deviation 0.022 μm). The Hartmannometer showed distortions amplitude of 0.131 µm (standard deviation 0.024 µm).
ISSN:1060-992X
1934-7898
DOI:10.3103/S1060992X24700395