Characterization and enhanced properties of plasma immersion ion processed diamond-like carbon films

The formation and properties of diamond-like carbon (DLC) films prepared on silicon substrates at room temperature, using C 2 H 2 –Ar plasma immersion ion processing, are investigated with respect to film deposition parameters. Decreases in the reactive gas-flow ratios of C 2 H 2 to Ar (F C 2 H 2 /F...

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 1999-09, Vol.17 (5), p.2525-2530
Hauptverfasser: He, X. M., Bardeau, J.-F., Walter, K. C., Nastasi, M.
Format: Artikel
Sprache:eng
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Zusammenfassung:The formation and properties of diamond-like carbon (DLC) films prepared on silicon substrates at room temperature, using C 2 H 2 –Ar plasma immersion ion processing, are investigated with respect to film deposition parameters. Decreases in the reactive gas-flow ratios of C 2 H 2 to Ar (F C 2 H 2 /F Ar ) or the gas pressure were found to decrease the hydrogen content, increase the density and hardness, and improve the surface finish of the DLC films, all of which led to enhanced tribological properties. Decreasing the friction coefficient requires increasing the hardness of the film and smoothing its surface, whereas increasing the wear resistance correlates with reducing both the hydrogen content and residual stress in DLC films. High hardness and optimum tribological properties were reached as the growth of DLC films was subjected to low-energy ion impingement, which was induced by a −150 V pulsed bias from the C 2 H 2 –Ar plasma produced at low reactive gas pressures with low F C 2 H 2 /F Ar ratios.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.581991