High temperature oxidation of (Ti 1-X Al X ) N coatings made by plasma enhanced chemical vapor deposition
(Ti 1-X Al X ) N coatings were deposited by the plasma enhanced chemical vapor deposition method using a gas mixture of TiCl 4 , AlCl 3 , NH 3 , H 2 and Ar, and the oxidation behavior at high temperatures as well as the oxidized structure of the coatings were examined. The oxidation rate of the coat...
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| Veröffentlicht in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 1999-01, Vol.17 (1), p.133-137 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | (Ti
1-X
Al
X
)
N
coatings were deposited by the plasma enhanced chemical vapor deposition method using a gas mixture of
TiCl
4
,
AlCl
3
,
NH
3
,
H
2
and Ar, and the oxidation behavior at high temperatures as well as the oxidized structure of the coatings were examined. The oxidation rate of the coatings at temperatures below 1000
°
C was found to fit well to a parabolic time dependence. It has also been found that up to 900
°
C
(Ti
1-X
Al
X
)
N
coatings at
X⩾0.25
showed considerably improved oxidation resistance compared to TiN, due to the formation of a dense
α
-Al
2
O
3
layer at the surface of the coatings. At
X |
|---|---|
| ISSN: | 0734-2101 1520-8559 |
| DOI: | 10.1116/1.581562 |