Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone

Unusual stoichiometry control in the atomic layer deposition of manganese borate films from manganese bis(tris(pyrazolyl)borate) and ozone

The atomic layer deposition (ALD) of films with the approximate compositions Mn3(BO3)2 and CoB2O4 is described using MnTp2 or CoTp2 [Tp = tris(pyrazolyl)borate] with ozone. The solid state decomposition temperatures of MnTp2 and CoTp2 are ∼370 and ∼340 °C, respectively. Preparative-scale sublimation...

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2016-09, Vol.34 (5)
Hauptverfasser: Klesko, Joseph P., Bellow, James A., Saly, Mark J., Winter, Charles H., Julin, Jaakko, Sajavaara, Timo
Format: Artikel
Sprache:eng
Schlagworte:
ATOMIC FORCE MICROSCOPY
BORATES
COBALT OXIDES
DEPOSITION
LAYERS
MANGANESE
MANGANESE OXIDES
MATERIALS SCIENCE
OZONE
ROUGHNESS
STOICHIOMETRY
SUBLIMATION
SURFACES
TIME-OF-FLIGHT METHOD
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY
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Zusammenfassung:The atomic layer deposition (ALD) of films with the approximate compositions Mn3(BO3)2 and CoB2O4 is described using MnTp2 or CoTp2 [Tp = tris(pyrazolyl)borate] with ozone. The solid state decomposition temperatures of MnTp2 and CoTp2 are ∼370 and ∼340 °C, respectively. Preparative-scale sublimations of MnTp2 and CoTp2 at 210 °C/0.05 Torr afforded >99% recoveries with
ISSN:0734-2101
1520-8559
DOI:10.1116/1.4961385