Visible light-induced photocatalytic properties of WO3 films deposited by dc reactive magnetron sputtering

The authors examined the photocatalytic activity of WO3 films (thickness 500–600 nm) deposited on a fused quartz substrate heated at 350–800 °C by dc reactive magnetron sputtering using a W metal target under the O2 gas pressure from 1.0 to 5.0 Pa. Films deposited at 800 °C under 5.0 Pa have excelle...

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Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2012-05, Vol.30 (3)
Hauptverfasser: Imai, Masahiro, Kikuchi, Maiko, Oka, Nobuto, Shigesato, Yuzo
Format: Artikel
Sprache:eng
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Zusammenfassung:The authors examined the photocatalytic activity of WO3 films (thickness 500–600 nm) deposited on a fused quartz substrate heated at 350–800 °C by dc reactive magnetron sputtering using a W metal target under the O2 gas pressure from 1.0 to 5.0 Pa. Films deposited at 800 °C under 5.0 Pa have excellent crystallinity of triclinic, P1(1) structure and a large surface area, as confirmed by x-ray diffraction, scanning electron microscopy, and atomic force microscopy. Exposure of acetaldehyde (CH3CHO) adsorbed onto the film surface to ultraviolet, visible, or standard fluorescence light induces oxidative photocatalytic decomposition indicated by a decrease in CH3CHO concentration and generation of CO2 gas. For all three types of irradiation, concentration ratio of decreased CH3CHO to increased CO2 is about 1:1, suggesting the possible presence of intermediates. The sputter-deposited WO3 film can be a good candidate as a visible light-responsive photocatalyst.
ISSN:0734-2101
1520-8559
DOI:10.1116/1.3696876