Atomic step patterning in nanoimprint lithography: Molecular dynamics study

Atomic-scale formability of nanoimprint lithography using an atomically stepped mold is investigated in a molecular dynamics simulation for inorganic SiO2 glass material. Fast Fourier transformation analysis of the surface height of the glass is performed to confirm the periodicity of the atomic-step pattern. From the analysis, the resolution of glass nanoimprint lithography is found to be 0.2 nm for the atomically stepped mold. This theoretical resolution agrees with the experimental resolution.