Ultrathin TiSiN overcoat protection layer for magnetic media
TiSiN ultrathin films (10–50 Å) deposited by reactive magnetron sputtering from Ti x Si y targets were used as anticorrosion overcoats to protect Co-containing recording media. Films’ growth, structure, composition, resistance against hydrolysis, and anticorrosion performances were studied by spectr...
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Veröffentlicht in: | Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films International Journal Devoted to Vacuum, Surfaces, and Films, 2011-09, Vol.29 (5), p.051502-051502-11 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | TiSiN ultrathin films (10–50 Å) deposited by reactive magnetron sputtering from Ti
x
Si
y
targets were used as anticorrosion overcoats to protect Co-containing recording media. Films’ growth, structure, composition, resistance against hydrolysis, and anticorrosion performances were studied by spectroscopy (x-ray reflectivity and diffraction, ellipsometry, x-ray photoelectron spectroscopy, Fourier transform infrared reflection–absorption spectroscopy) and simulated by molecular dynamics (using modified Tersoff-type interatomic interactions). TiSiN ultrathin overcoats were found to be dense amorphous oxynitrides containing Ti–O–Si linkages. The conversion of SiN
x
into SiO
x
by hydrolysis was prevented by introducing less than 20 at. % of Ti in the films. Thanks to the formation of Ti–O–Si linkages which densify the films and reduce oxygen diffusion, good corrosion protection of the magnetic media was achieved down to 28 Å TiSiN overcoat thickness. |
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ISSN: | 0734-2101 1553-1813 1520-8559 |
DOI: | 10.1116/1.3607423 |