Development of ion sources from ionic liquids for microfabrication
In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid EMI-BF 4 to obtain stable emission currents up to the 10 μ A regime. ILIS ( EMI-BF 4...
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| Veröffentlicht in: | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2010-05, Vol.28 (3), p.L25-L27 |
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| Sprache: | eng |
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| container_end_page | L27 |
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| container_title | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena |
| container_volume | 28 |
| creator | Perez-Martinez, Carla Guilet, Stéphane Gogneau, Noëlle Jegou, Pascale Gierak, Jacques Lozano, Paulo |
| description | In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid
EMI-BF
4
to obtain stable emission currents up to the
10
μ
A
regime. ILIS
(
EMI-BF
4
)
engraving properties were then investigated. The results and the chemical analysis of the patterned substrates suggest that reactive ion species can be generated from ILIS. This possibility is of major interest to allow decisive advances in the field of focused ion beam applications. |
| doi_str_mv | 10.1116/1.3432125 |
| format | Article |
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EMI-BF
4
to obtain stable emission currents up to the
10
μ
A
regime. ILIS
(
EMI-BF
4
)
engraving properties were then investigated. The results and the chemical analysis of the patterned substrates suggest that reactive ion species can be generated from ILIS. This possibility is of major interest to allow decisive advances in the field of focused ion beam applications.</description><identifier>ISSN: 1071-1023</identifier><identifier>ISSN: 2166-2746</identifier><identifier>EISSN: 1520-8567</identifier><identifier>EISSN: 2166-2754</identifier><identifier>DOI: 10.1116/1.3432125</identifier><identifier>CODEN: JVTBD9</identifier><language>eng</language><publisher>American Vacuum Society</publisher><ispartof>Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2010-05, Vol.28 (3), p.L25-L27</ispartof><rights>American Vacuum Society</rights><rights>2010 American Vacuum Society</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c420t-4d7da0286152e54a429e4390904a86c3d53bef210b7c1c800f64bba6bd17316b3</citedby><cites>FETCH-LOGICAL-c420t-4d7da0286152e54a429e4390904a86c3d53bef210b7c1c800f64bba6bd17316b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,794,4512,27924,27925</link.rule.ids></links><search><creatorcontrib>Perez-Martinez, Carla</creatorcontrib><creatorcontrib>Guilet, Stéphane</creatorcontrib><creatorcontrib>Gogneau, Noëlle</creatorcontrib><creatorcontrib>Jegou, Pascale</creatorcontrib><creatorcontrib>Gierak, Jacques</creatorcontrib><creatorcontrib>Lozano, Paulo</creatorcontrib><title>Development of ion sources from ionic liquids for microfabrication</title><title>Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena</title><description>In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid
EMI-BF
4
to obtain stable emission currents up to the
10
μ
A
regime. ILIS
(
EMI-BF
4
)
engraving properties were then investigated. The results and the chemical analysis of the patterned substrates suggest that reactive ion species can be generated from ILIS. This possibility is of major interest to allow decisive advances in the field of focused ion beam applications.</description><issn>1071-1023</issn><issn>2166-2746</issn><issn>1520-8567</issn><issn>2166-2754</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><recordid>eNqNkE9LAzEQxYMoWKsHv8FeFbbOJNns9iJo6z8oeNFzSLIJRLpNTbYFv71ZW9CL4mmGmR9v3htCzhEmiCiucMI4o0irAzLCikLZVKI-zD3UWCJQdkxOUnoDAFExNiK3c7u1y7Du7Kovgit8WBUpbKKxqXAxdMPAm2Lp3ze-zaMQi86bGJzS0RvV5_UpOXJqmezZvo7J6_3dy-yxXDw_PM1uFqXhFPqSt3WrgDYi27IVV5xOLWdTmAJXjTCsrZi2jiLo2qBpAJzgWiuhW6wZCs3G5GKnm8-nFK2T6-g7FT8kghzCS5T78Jm93rHJ-P7L5e_wjw_I4OTApixw-W-Bv-BtiN-gXLeOfQKuIn1v</recordid><startdate>20100501</startdate><enddate>20100501</enddate><creator>Perez-Martinez, Carla</creator><creator>Guilet, Stéphane</creator><creator>Gogneau, Noëlle</creator><creator>Jegou, Pascale</creator><creator>Gierak, Jacques</creator><creator>Lozano, Paulo</creator><general>American Vacuum Society</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20100501</creationdate><title>Development of ion sources from ionic liquids for microfabrication</title><author>Perez-Martinez, Carla ; Guilet, Stéphane ; Gogneau, Noëlle ; Jegou, Pascale ; Gierak, Jacques ; Lozano, Paulo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c420t-4d7da0286152e54a429e4390904a86c3d53bef210b7c1c800f64bba6bd17316b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Perez-Martinez, Carla</creatorcontrib><creatorcontrib>Guilet, Stéphane</creatorcontrib><creatorcontrib>Gogneau, Noëlle</creatorcontrib><creatorcontrib>Jegou, Pascale</creatorcontrib><creatorcontrib>Gierak, Jacques</creatorcontrib><creatorcontrib>Lozano, Paulo</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Perez-Martinez, Carla</au><au>Guilet, Stéphane</au><au>Gogneau, Noëlle</au><au>Jegou, Pascale</au><au>Gierak, Jacques</au><au>Lozano, Paulo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of ion sources from ionic liquids for microfabrication</atitle><jtitle>Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena</jtitle><date>2010-05-01</date><risdate>2010</risdate><volume>28</volume><issue>3</issue><spage>L25</spage><epage>L27</epage><pages>L25-L27</pages><issn>1071-1023</issn><issn>2166-2746</issn><eissn>1520-8567</eissn><eissn>2166-2754</eissn><coden>JVTBD9</coden><abstract>In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid
EMI-BF
4
to obtain stable emission currents up to the
10
μ
A
regime. ILIS
(
EMI-BF
4
)
engraving properties were then investigated. The results and the chemical analysis of the patterned substrates suggest that reactive ion species can be generated from ILIS. This possibility is of major interest to allow decisive advances in the field of focused ion beam applications.</abstract><pub>American Vacuum Society</pub><doi>10.1116/1.3432125</doi><tpages>3</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 1071-1023 |
| ispartof | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2010-05, Vol.28 (3), p.L25-L27 |
| issn | 1071-1023 2166-2746 1520-8567 2166-2754 |
| language | eng |
| recordid | cdi_scitation_primary_10_1116_1_3432125 |
| source | 美国小型学会期刊集（AIP Scitation平台）; Alma/SFX Local Collection |
| title | Development of ion sources from ionic liquids for microfabrication |
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