Development of ion sources from ionic liquids for microfabrication

In this article the authors present the potential of ionic liquid ion sources (ILISs) for direct microfabrication of silicon structures. The authors have developed a specific source geometry using the ionic liquid EMI-BF 4 to obtain stable emission currents up to the 10 μ A regime. ILIS ( EMI-BF 4 ) engraving properties were then investigated. The results and the chemical analysis of the patterned substrates suggest that reactive ion species can be generated from ILIS. This possibility is of major interest to allow decisive advances in the field of focused ion beam applications.