Large scale deposition of two-dimensional tungsten disulfide films using radio frequency magnetron sputtering

Radio frequency magnetron sputtering is an efficient deposition method to produce good quality thin films. Usage of such an industry viable method in the deposition of materials like tungsten disulfide (WS2) can be a major leap in the semiconductor industry owing to the fascinating properties that WS2 possess. Here we report the deposition of two dimensional WS2 on quartz substrates using a one-step sputtering process in which metal tungsten is sputtered in sulfur ambience. The absorbance spectra of the samples showed the excitonic peaks of WS2. From the Raman spectra, we were able to confirm the formation and purity of WS2 in the sputtered samples.