Effect of deposition time on the properties of ZnO films fabricated by pulsed laser deposition

ZnO films deposited with various deposition time, ranging from 50 sec to 3 min, are grown on the Al2O3 substrates using pulsed laser deposition (PLD) technique. The films are deposited with laser energy of 100 mJ, pressure of 50 mTorr and temperature of 300°C. Structural, morphological and optical characterizations are conducted by means of X-Ray diffraction (XRD), field emission scanning electron microscope (FE-SEM), and Ultraviolet–visible (UV-VIS) spectroscopy. The significant changes in the nanostructure and the optical properties of the ZnO films with different deposition time are observed. This preliminary study is intended to seek the most optimal deposition duration of ZnO films which may be applied as the suitable base films for practical applications in sensing devices and in other technology-related fields.