Measurements outside resonance with piezoresponse force microscopy

In this work, we report the advantages of following a protocol to perform measurements of piezoresponse force microscopy (PFM) away from the tip-sample contact resonance. The protocol established in this work is based on Soergel's work [J. Phys. D: Appl. Phys. 44 (2011) 464003]. PFM measurement...

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Veröffentlicht in:AIP conference proceedings 2021-11, Vol.2416 (1)
Hauptverfasser: Garduño-Medina, A., Vázquez-Delgado, M. A., Diliegros-Godines, C. J., García-Vázquez, V., Flores-Ruiz, F. J.
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Sprache:eng
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Zusammenfassung:In this work, we report the advantages of following a protocol to perform measurements of piezoresponse force microscopy (PFM) away from the tip-sample contact resonance. The protocol established in this work is based on Soergel's work [J. Phys. D: Appl. Phys. 44 (2011) 464003]. PFM measurements out-of-plane were carried out in the range of 10-100 kHz. The experimental background, that affects the domain contrast during PFM measurements, was reduced by analyzing the X-signal from the lock-in amplifier (LIA) during a frequency sweep measurement on a glass slide (non-piezoelectric). Optimal contrast in X-signal was attained through set the phase of the LIA to reach a null contrast in the Y-signal. Then, the X-Y and R-Θ signals are stored using the optimal conditions established for LIA. The protocol described was applied to a sol-gel BiFeO3 film and a reference sample of periodically poled lithium niobate.
ISSN:0094-243X
1551-7616
DOI:10.1063/5.0068705