Diagnosis and analysis of laser induced plasma parameters for silicon carbide produced by Nd:YAG laser
In this work, we used the optical emission spectrum technique to analyze the spectrum resulting from the Si:C plasma produced by laser Nd:YAG with a wavelength of (1064) nm, duration of (9) ns, and a focal length of (10) cm in the range of energy (400- 800) mJ. The electron temperature (Te) was calc...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | In this work, we used the optical emission spectrum technique to analyze the spectrum resulting from the Si:C plasma produced by laser Nd:YAG with a wavelength of (1064) nm, duration of (9) ns, and a focal length of (10) cm in the range of energy (400- 800) mJ. The electron temperature (Te) was calculated in the Boltzmann plot method, while the electron density (ne) was calculated using a stark broadening line profile, also another plasma parameters were calculated such as plasma (fp), Debye length (λD) and Debye number (ND). At mixing ratios (X= 0.5), the Si:C plasma spectrum was recorded for different energies. The change in electron temperature and the densities was studied as a function of the laser energies. |
---|---|
ISSN: | 0094-243X 1551-7616 |
DOI: | 10.1063/5.0067437 |