High-frequency and below bandgap anisotropic dielectric constants in α-(AlxGa1−x)2O3 ( 0 ≤ x ≤ 1)

A Mueller matrix spectroscopic ellipsometry approach was used to investigate the anisotropic dielectric constants of corundum α-(AlxGa1−x)2O3 thin films in their below bandgap spectral regions. The sample set was epitaxially grown using plasma-assisted molecular beam epitaxy on m-plane sapphire. The...

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Veröffentlicht in:Applied physics letters 2021-08, Vol.119 (9)
Hauptverfasser: Hilfiker, Matthew, Kilic, Ufuk, Stokey, Megan, Jinno, Riena, Cho, Yongjin, Xing, Huili Grace, Jena, Debdeep, Korlacki, Rafał, Schubert, Mathias
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Sprache:eng
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Zusammenfassung:A Mueller matrix spectroscopic ellipsometry approach was used to investigate the anisotropic dielectric constants of corundum α-(AlxGa1−x)2O3 thin films in their below bandgap spectral regions. The sample set was epitaxially grown using plasma-assisted molecular beam epitaxy on m-plane sapphire. The spectroscopic ellipsometry measurements were performed at multiple azimuthal angles to resolve the uniaxial dielectric properties. A Cauchy dispersion model was applied, and high-frequency dielectric constants are determined for polarization perpendicular ( ε ∞ , ⊥) and parallel ( ε ∞ , ∥) to the thin film c-axis. The optical birefringence is negative throughout the composition range, and the overall index of refraction substantially decreases upon incorporation of Al. We find small bowing parameters of the high-frequency dielectric constants with b ⊥ = 0.386 and b ∥ = 0.307.
ISSN:0003-6951
1077-3118
DOI:10.1063/5.0064528