Nanoimprintable super antireflective matte black surface achieved by hierarchical micro and nano architecture

We report an effective antireflective surface structure fabricated by a sequential process comprising colloidal lithography, maskless plasma etching, and inverted nanoimprinting replication. The hierarchical inverse micro–nano structure is composed of randomly positioned microholes of 3–5 μm in diam...

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Veröffentlicht in:	Journal of applied physics 2021-02, Vol.129 (7)
Hauptverfasser:	Shinotsuka, Kei, Dai, Kotaro, Shen, Lingfeng, Hirama, Satoru, Hatta, Yoshihisa, Okamoto, Takayuki
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Colloiding Electric field strength Finite element method Maxwell's equations Microholes Optical instruments Plasma etching Reflectance Stray light Structural hierarchy Surface structure
Online-Zugang:	Volltext
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