Nanoimprintable super antireflective matte black surface achieved by hierarchical micro and nano architecture

We report an effective antireflective surface structure fabricated by a sequential process comprising colloidal lithography, maskless plasma etching, and inverted nanoimprinting replication. The hierarchical inverse micro–nano structure is composed of randomly positioned microholes of 3–5 μm in diam...

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Veröffentlicht in:Journal of applied physics 2021-02, Vol.129 (7)
Hauptverfasser: Shinotsuka, Kei, Dai, Kotaro, Shen, Lingfeng, Hirama, Satoru, Hatta, Yoshihisa, Okamoto, Takayuki
Format: Artikel
Sprache:eng
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Zusammenfassung:We report an effective antireflective surface structure fabricated by a sequential process comprising colloidal lithography, maskless plasma etching, and inverted nanoimprinting replication. The hierarchical inverse micro–nano structure is composed of randomly positioned microholes of 3–5 μm in diameter and numerous nanoprotrusions of 60–80 nm diameter located at the bottom surface of the microholes. The inverse micro–nano structure behaves as a high-performance light absorber, exhibiting outstanding optical performances of 0.78% for hemispherical reflectance, and 0.011% for specular reflectance at the incident angle 5° off normal, both on average in the visible range (380–780 nm). Additionally, the optical behavior of the inverse micro–nano structure is numerically investigated with the electric field strength in both frequency and time domains by the finite-element method for Maxwell's equation. As the inverse micro–nano structure exhibits significantly low reflectance and black appearance, it can be applied to antiglare/antireflective surfaces, suitable for the reduction of stray light existing inside of a housing of optical instruments.
ISSN:0021-8979
1089-7550
DOI:10.1063/5.0039723