Self-aligned single-exposure deep x-ray lithography

The method of deep X-ray lithography has been developed, which allows the formation of self-aligned microstructures. Examples of microstructures are presented.

Bibliographische Detailangaben

Hauptverfasser:	Nazmov, V. P., Goldenberg, B. G., Reznikova, E. F., Boerner, M.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Lithography Self alignment
Online-Zugang:	Volltext
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