Self-aligned single-exposure deep x-ray lithography

Self-aligned single-exposure deep x-ray lithography

The method of deep X-ray lithography has been developed, which allows the formation of self-aligned microstructures. Examples of microstructures are presented.

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Bibliographische Detailangaben
Hauptverfasser: Nazmov, V. P., Goldenberg, B. G., Reznikova, E. F., Boerner, M.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Lithography
Self alignment
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Beschreibung
Zusammenfassung:The method of deep X-ray lithography has been developed, which allows the formation of self-aligned microstructures. Examples of microstructures are presented.
ISSN:0094-243X
1551-7616
DOI:10.1063/5.0030469