Low-energy electron beam application for SiCN-based coatings deposition

Low-energy electron beam application for SiCN-based coatings deposition

The method of low-temperature (200°C) deposition of SiCN-coatings by decomposition of hexamethyldisilazane (HMDS) in a wide (700 cm2) radially-divergent low-energy (200 eV) electron beam plasma has been investigated. It is shown that the degree of heterogeneity of the thickness of the deposited coat...

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Bibliographische Detailangaben
Hauptverfasser: Dmitriev, A. S., Menshakov, A. I.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Coatings
Composition
Deposition
Electron beams
Emission analysis
Infrared analysis
Infrared spectroscopy
Low temperature
Optical emission spectroscopy
Silicon carbonitride
Spectrum analysis
Thickness
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Beschreibung
Zusammenfassung:The method of low-temperature (200°C) deposition of SiCN-coatings by decomposition of hexamethyldisilazane (HMDS) in a wide (700 cm2) radially-divergent low-energy (200 eV) electron beam plasma has been investigated. It is shown that the degree of heterogeneity of the thickness of the deposited coatings in such a system does not exceed 10-15%. The analysis of the composition of coatings by the method of IR-spectroscopy, and analysis of the composition of the plasma by optical emission spectroscopy were carried out. SiCN-based coatings with a thickness of 4–5 µm and hardness up to 8–10 GPa were obtained.
ISSN:0094-243X
1551-7616
DOI:10.1063/1.5134246