Low temperature Cu bonding with large tolerance of surface oxidation
A novel method of low temperature all-Cu bonding was developed, which has a large tolerance for Cu surface oxidation and can even bond Cu with a thick oxide layer at 250 °C. It is significant for the chip level bonding because traditional methods have strict requirements for surface quality. The key...
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Veröffentlicht in: | AIP advances 2019-05, Vol.9 (5), p.055127-055127-5 |
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container_title | AIP advances |
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creator | Ren, Hui Mu, Fengwen Shin, Seongbin Liu, Lei Zou, Guisheng Suga, Tadatomo |
description | A novel method of low temperature all-Cu bonding was developed, which has a large tolerance for Cu surface oxidation and can even bond Cu with a thick oxide layer at 250 °C. It is significant for the chip level bonding because traditional methods have strict requirements for surface quality. The key process is to combine Cu nanoparticle paste and Pt-catalyzed formic acid vapor, which improved the bonding strength of oxidized-Cu by ∼78.5% and is expected to simplify the bonding process. To understand the mechanisms, interfacial analyses of the microstructure and composition were carried out, along with a surface analysis. |
doi_str_mv | 10.1063/1.5097382 |
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fullrecord | <record><control><sourceid>proquest_scita</sourceid><recordid>TN_cdi_scitation_primary_10_1063_1_5097382</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><doaj_id>oai_doaj_org_article_8f58ed30b9e14e939e60775f8c3b8089</doaj_id><sourcerecordid>2232860888</sourcerecordid><originalsourceid>FETCH-LOGICAL-c428t-598c9ea087af96348669a2ad45db656f222d7ede902ff2a14eb3091d037de653</originalsourceid><addsrcrecordid>eNqdkE1Lw0AQhoMoWKoH_8GCJ4XU_Ug2u0epX4WCl96XTXa2bkmzcbOx-u9Nm6KencsMw8Mzw5skVwTPCObsjsxyLAsm6EkyoSQXKaOUn_6Zz5PLrtvgoTJJsMgmycPS71CEbQtBxz4Amveo9I1xzRrtXHxDtQ5rQNHXA9BUgLxFXR-s3o-fzujofHORnFldd3B57NNk9fS4mr-ky9fnxfx-mVYZFTHNpagkaCwKbSVnmeBcaqpNlpuS59xSSk0BBiSm1lJNMigZlsRgVhjgOZsmi1FrvN6oNritDl_Ka6cOCx_WSofoqhqUsLkAw3ApYdBIJoHjositqFgpsJCD63p0tcG_99BFtfF9aIbvFaWMCo6FEAN1M1JV8F0XwP5cJVjtI1dEHSMf2NuR7SoXD7H8D_7w4RdUrbHsG5NhjW4</addsrcrecordid><sourcetype>Open Website</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2232860888</pqid></control><display><type>article</type><title>Low temperature Cu bonding with large tolerance of surface oxidation</title><source>DOAJ Directory of Open Access Journals</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Alma/SFX Local Collection</source><source>Free Full-Text Journals in Chemistry</source><creator>Ren, Hui ; Mu, Fengwen ; Shin, Seongbin ; Liu, Lei ; Zou, Guisheng ; Suga, Tadatomo</creator><creatorcontrib>Ren, Hui ; Mu, Fengwen ; Shin, Seongbin ; Liu, Lei ; Zou, Guisheng ; Suga, Tadatomo</creatorcontrib><description>A novel method of low temperature all-Cu bonding was developed, which has a large tolerance for Cu surface oxidation and can even bond Cu with a thick oxide layer at 250 °C. It is significant for the chip level bonding because traditional methods have strict requirements for surface quality. The key process is to combine Cu nanoparticle paste and Pt-catalyzed formic acid vapor, which improved the bonding strength of oxidized-Cu by ∼78.5% and is expected to simplify the bonding process. To understand the mechanisms, interfacial analyses of the microstructure and composition were carried out, along with a surface analysis.</description><identifier>ISSN: 2158-3226</identifier><identifier>EISSN: 2158-3226</identifier><identifier>DOI: 10.1063/1.5097382</identifier><identifier>CODEN: AAIDBI</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Bonding strength ; Copper ; Formic acid ; Low temperature ; Nanoparticles ; Oxidation ; Surface analysis (chemical) ; Surface properties</subject><ispartof>AIP advances, 2019-05, Vol.9 (5), p.055127-055127-5</ispartof><rights>Author(s)</rights><rights>2019 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c428t-598c9ea087af96348669a2ad45db656f222d7ede902ff2a14eb3091d037de653</citedby><cites>FETCH-LOGICAL-c428t-598c9ea087af96348669a2ad45db656f222d7ede902ff2a14eb3091d037de653</cites><orcidid>0000-0002-3368-5136 ; 0000-0002-1029-0326 ; 0000-0001-7396-9347</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,860,2096,27903,27904</link.rule.ids></links><search><creatorcontrib>Ren, Hui</creatorcontrib><creatorcontrib>Mu, Fengwen</creatorcontrib><creatorcontrib>Shin, Seongbin</creatorcontrib><creatorcontrib>Liu, Lei</creatorcontrib><creatorcontrib>Zou, Guisheng</creatorcontrib><creatorcontrib>Suga, Tadatomo</creatorcontrib><title>Low temperature Cu bonding with large tolerance of surface oxidation</title><title>AIP advances</title><description>A novel method of low temperature all-Cu bonding was developed, which has a large tolerance for Cu surface oxidation and can even bond Cu with a thick oxide layer at 250 °C. It is significant for the chip level bonding because traditional methods have strict requirements for surface quality. The key process is to combine Cu nanoparticle paste and Pt-catalyzed formic acid vapor, which improved the bonding strength of oxidized-Cu by ∼78.5% and is expected to simplify the bonding process. To understand the mechanisms, interfacial analyses of the microstructure and composition were carried out, along with a surface analysis.</description><subject>Bonding strength</subject><subject>Copper</subject><subject>Formic acid</subject><subject>Low temperature</subject><subject>Nanoparticles</subject><subject>Oxidation</subject><subject>Surface analysis (chemical)</subject><subject>Surface properties</subject><issn>2158-3226</issn><issn>2158-3226</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><sourceid>DOA</sourceid><recordid>eNqdkE1Lw0AQhoMoWKoH_8GCJ4XU_Ug2u0epX4WCl96XTXa2bkmzcbOx-u9Nm6KencsMw8Mzw5skVwTPCObsjsxyLAsm6EkyoSQXKaOUn_6Zz5PLrtvgoTJJsMgmycPS71CEbQtBxz4Amveo9I1xzRrtXHxDtQ5rQNHXA9BUgLxFXR-s3o-fzujofHORnFldd3B57NNk9fS4mr-ky9fnxfx-mVYZFTHNpagkaCwKbSVnmeBcaqpNlpuS59xSSk0BBiSm1lJNMigZlsRgVhjgOZsmi1FrvN6oNritDl_Ka6cOCx_WSofoqhqUsLkAw3ApYdBIJoHjositqFgpsJCD63p0tcG_99BFtfF9aIbvFaWMCo6FEAN1M1JV8F0XwP5cJVjtI1dEHSMf2NuR7SoXD7H8D_7w4RdUrbHsG5NhjW4</recordid><startdate>201905</startdate><enddate>201905</enddate><creator>Ren, Hui</creator><creator>Mu, Fengwen</creator><creator>Shin, Seongbin</creator><creator>Liu, Lei</creator><creator>Zou, Guisheng</creator><creator>Suga, Tadatomo</creator><general>American Institute of Physics</general><general>AIP Publishing LLC</general><scope>AJDQP</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>DOA</scope><orcidid>https://orcid.org/0000-0002-3368-5136</orcidid><orcidid>https://orcid.org/0000-0002-1029-0326</orcidid><orcidid>https://orcid.org/0000-0001-7396-9347</orcidid></search><sort><creationdate>201905</creationdate><title>Low temperature Cu bonding with large tolerance of surface oxidation</title><author>Ren, Hui ; Mu, Fengwen ; Shin, Seongbin ; Liu, Lei ; Zou, Guisheng ; Suga, Tadatomo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c428t-598c9ea087af96348669a2ad45db656f222d7ede902ff2a14eb3091d037de653</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>Bonding strength</topic><topic>Copper</topic><topic>Formic acid</topic><topic>Low temperature</topic><topic>Nanoparticles</topic><topic>Oxidation</topic><topic>Surface analysis (chemical)</topic><topic>Surface properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ren, Hui</creatorcontrib><creatorcontrib>Mu, Fengwen</creatorcontrib><creatorcontrib>Shin, Seongbin</creatorcontrib><creatorcontrib>Liu, Lei</creatorcontrib><creatorcontrib>Zou, Guisheng</creatorcontrib><creatorcontrib>Suga, Tadatomo</creatorcontrib><collection>AIP Open Access Journals</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>DOAJ Directory of Open Access Journals</collection><jtitle>AIP advances</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ren, Hui</au><au>Mu, Fengwen</au><au>Shin, Seongbin</au><au>Liu, Lei</au><au>Zou, Guisheng</au><au>Suga, Tadatomo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Low temperature Cu bonding with large tolerance of surface oxidation</atitle><jtitle>AIP advances</jtitle><date>2019-05</date><risdate>2019</risdate><volume>9</volume><issue>5</issue><spage>055127</spage><epage>055127-5</epage><pages>055127-055127-5</pages><issn>2158-3226</issn><eissn>2158-3226</eissn><coden>AAIDBI</coden><abstract>A novel method of low temperature all-Cu bonding was developed, which has a large tolerance for Cu surface oxidation and can even bond Cu with a thick oxide layer at 250 °C. It is significant for the chip level bonding because traditional methods have strict requirements for surface quality. The key process is to combine Cu nanoparticle paste and Pt-catalyzed formic acid vapor, which improved the bonding strength of oxidized-Cu by ∼78.5% and is expected to simplify the bonding process. To understand the mechanisms, interfacial analyses of the microstructure and composition were carried out, along with a surface analysis.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.5097382</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0002-3368-5136</orcidid><orcidid>https://orcid.org/0000-0002-1029-0326</orcidid><orcidid>https://orcid.org/0000-0001-7396-9347</orcidid><oa>free_for_read</oa></addata></record> |
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subjects | Bonding strength Copper Formic acid Low temperature Nanoparticles Oxidation Surface analysis (chemical) Surface properties |
title | Low temperature Cu bonding with large tolerance of surface oxidation |
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