Nanomechanical and wettability properties of Bi2Te3 thin films: Effects of post-annealing

In this study, Bi2Te3 thin films were deposited on SiO2/Si(100) substrates by pulsed laser deposition (PLD) at 250 °C. The films were then annealed in-situ in the deposition chamber at various annealing temperatures (Ta ) ranging from 200 to 300 °C. The microstructural, morphological, and nanomechan...

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Veröffentlicht in:Journal of applied physics 2017-05, Vol.121 (17)
Hauptverfasser: Jian, Sheng-Rui, Le, Phuoc Huu, Luo, Chih-Wei, Juang, Jenh-Yih
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Sprache:eng
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Zusammenfassung:In this study, Bi2Te3 thin films were deposited on SiO2/Si(100) substrates by pulsed laser deposition (PLD) at 250 °C. The films were then annealed in-situ in the deposition chamber at various annealing temperatures (Ta ) ranging from 200 to 300 °C. The microstructural, morphological, and nanomechanical properties of the Bi2Te3 thin films were investigated by X-ray diffraction (XRD), scanning electron microscopy, and nanoindentation techniques, respectively. The XRD results indicated that all the Bi2Te3 thin films have high crystalline quality with predominant (0015) texture. Nano-indentation measurements performed with a Berkovich nanoindenter operating under the continuous contact stiffness measurement mode revealed that both the hardness and Young's modulus of the Bi2Te3 films decreased with increasing Ta . In addition, the water contact angle measurements were carried out to delineate the effects of annealing on the changes in the surface energy and wettability of the films.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4982911