Epitaxial yttrium iron garnet film for fabrication of high frequency on-chip inductors

The application of epitaxial yttrium iron garnet (YIG) thin film on high frequency on-chip spiral inductors is investigated. The YIG thin film with the thickness of 3.6  μ m was grown on GGG(111) substrate using the liquid phase method, which exhibits relatively high saturation magnetization 4πM s o...

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Veröffentlicht in:Applied physics letters 2016-10, Vol.109 (16)
Hauptverfasser: Wang, Gang, Liu, Houfang, Wu, Hao, Li, Xiaoning, Qiu, Haochuan, Yang, Yi, Qu, Bingjun, Ren, Tian-Ling, Han, Xiufeng, Zhang, Ruyi, Wang, Hong
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Sprache:eng
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Zusammenfassung:The application of epitaxial yttrium iron garnet (YIG) thin film on high frequency on-chip spiral inductors is investigated. The YIG thin film with the thickness of 3.6  μ m was grown on GGG(111) substrate using the liquid phase method, which exhibits relatively high saturation magnetization 4πM s of 1615 Oe close to the bulk value of 1750 Oe and low initial coercivity H c of 0.5 Oe that minimizes the hysteretic losses. Subsequently, the spiral inductors were directly fabricated on the YIG/GGG(111) substrate. The results show substantial improvement in the optimum operating frequency and self-resonance frequency of the on-chip spiral inductor with the YIG thin film with an increase of 50% up to ∼7.5 GHz and 14.2 GHz, respectively, implying that on-chip spiral inductors with the YIG thin film can be applied to much higher frequency RF circuits.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.4964642