Publisher's Note: “Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals” [J. Appl. Phys. 118, 233304 (2015)]

Publisher's Note: “Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals” [J. Appl. Phys. 118, 233304 (2015)]

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Veröffentlicht in:Journal of applied physics 2016-02, Vol.119 (5)
Hauptverfasser: Nakazaki, Nobuya, Takao, Yoshinori, Eriguchi, Koji, Ono, Kouichi
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Sprache:eng
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Molecular dynamics
Plasmas
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container_title Journal of applied physics
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creator Nakazaki, Nobuya
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Ono, Kouichi
description
doi_str_mv 10.1063/1.4941034
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subjects Molecular dynamics
Plasmas
title Publisher's Note: “Molecular dynamics simulations of Si etching in Cl- and Br-based plasmas: Cl+ and Br+ ion incidence in the presence of Cl and Br neutrals” [J. Appl. Phys. 118, 233304 (2015)]
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