Cleaved-facet violet laser diodes with lattice-matched Al 0.82 In 0.18 N / GaN multilayers as n -cladding

Electrically injected, edge-emitting cleaved-facet violet laser diodes were realized using a 480 nm thick lattice matched Si doped Al 0.82 In 0.18 N / GaN multilayer as the cladding on the n -side of the waveguide. Far-field measurements verify strong mode confinement to the waveguide. An extra volt...

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Veröffentlicht in:Applied physics letters 2011-05, Vol.98 (20), p.201112-201112-3
Hauptverfasser: Charash, R., Kim-Chauveau, H., Lamy, J-M., Akther, M., Maaskant, P. P., Frayssinet, E., de Mierry, P., Dräger, A. D., Duboz, J-Y., Hangleiter, A., Corbett, B.
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Zusammenfassung:Electrically injected, edge-emitting cleaved-facet violet laser diodes were realized using a 480 nm thick lattice matched Si doped Al 0.82 In 0.18 N / GaN multilayer as the cladding on the n -side of the waveguide. Far-field measurements verify strong mode confinement to the waveguide. An extra voltage is measured and investigated using separate mesa structures with a single AlInN insertion. This showed that the electron current has a small thermally activated shunt resistance with a barrier of 0.135 eV and a current which scales according to V n , where n ∼ 3 at current densities appropriate to laser operation.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.3589974