Aging- and annealing-induced variations in Nb / Al - AlO x / Nb tunnel junction properties
In this paper, we present studies of room temperature aging and annealing of Nb / Al - AlO x / Nb tunnel junctions with the size of 2 - 3 μ m 2 . We observed a noticeable drop of junction normal resistance R n unusually combined with increase in subgap resistance R j as a result of aging. Variatio...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 2011-01, Vol.109 (2), p.024502-024502-5 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | In this paper, we present studies of room temperature aging and annealing of
Nb
/
Al
-
AlO
x
/
Nb
tunnel junctions with the size of
2
-
3
μ
m
2
. We observed a noticeable drop of junction normal resistance
R
n
unusually combined with increase in subgap resistance
R
j
as a result of aging. Variation in both
R
n
and
R
j
are subject to the junction size effect. An effect of aging history on the junction degradation after consequent annealing was discovered. Discussion and interpretation of the observed phenomena are presented in terms of structural ordering and reconstruction in the
AlO
x
layer, driven by diffusion flows enhanced due to stress relaxation processes in the Al layer interfacing the
AlO
x
layer. |
---|---|
ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.3532040 |