Ultracompact/ultralow power electron cyclotron resonance ion sourcefor multipurpose applications

In order to drastically reduce the power consumption of a microwave ion source, we have studied some specific discharge cavity geometries in order to reduce the operating point below 1 W of microwave power (at 2.45 GHz). We show that it is possible to drive an electron cyclotron resonance ion source with a transmitter technology similar to those used for cellular phones. By the reduction in the size and of the required microwave power, we have developed a new type of ultralow cost ion sources. This microwave discharge system (called COMIC, for COmpact MIcrowave and Coaxial) can be used as a source of light, plasma or ions. We will show geometries of conductive cavities where it is possible, in a 20 mm diameter chamber, to reduce the ignition of the plasma below 100 mW and define typical operating points around 5 W. Inside a simple vacuum chamber it is easy to place the source and its extraction system anywhere and fully under vacuum. In that case, current densities from 0.1 to 10 mA / cm 2 (Ar, extraction 4 mm, 1 mAe, 20 kV) have been observed. Preliminary measurements and calculations show the possibility, with a two electrodes system, to extract beams within a low emittance. The first application for these ion sources is the ion injection for charge breeding, surface analyzing system and surface treatment. For this purpose, a very small extraction hole is used (typically 3/10 mm for a 3 μ A extracted current with 2 W of HF power). Mass spectrum and emittance measurements will be presented. In these conditions, values down to 1 π mm mrad at 15 kV ( 1 σ ) are observed, thus very close to the ones currently observed for a surface ionization source. A major interest of this approach is the possibility to connect together several COMIC devices. We will introduce some new on-going developments such as sources for high voltage implantation platforms, fully quartz radioactive ion source at ISOLDE or large plasma generators for plasma immersion, broad or ribbon beams generation.