Field-electron emission at 300 K in self-assembled arrays of silicon nanowires
Dense ensembles of silicon nanowires were prepared by metal-catalyzed chemical vapor deposition on silicon substrates. Some of these ensembles were doped with phosphorus during growth. The nanowires were characterized using scanning electron microscopy, x-ray diffraction, and mass spectroscopy. Fiel...
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Veröffentlicht in: | Applied physics letters 2006-09, Vol.89 (9), p.093122-093122-3 |
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Hauptverfasser: | , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Dense ensembles of silicon nanowires were prepared by metal-catalyzed chemical vapor deposition on silicon substrates. Some of these ensembles were doped with phosphorus during growth. The nanowires were characterized using scanning electron microscopy, x-ray diffraction, and mass spectroscopy. Field emission of electrons from these structures was studied at room temperature in ultrahigh vacuum. The measurements were carried out using a parallel-plate diode cell. At high applied fields, the current-voltage characteristics deviate from the Fowler-Nordheim law and exhibit a stepwise increase of the current with increasing voltage at
300
K
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.2337279 |