Field-electron emission at 300 K in self-assembled arrays of silicon nanowires

Dense ensembles of silicon nanowires were prepared by metal-catalyzed chemical vapor deposition on silicon substrates. Some of these ensembles were doped with phosphorus during growth. The nanowires were characterized using scanning electron microscopy, x-ray diffraction, and mass spectroscopy. Fiel...

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Veröffentlicht in:Applied physics letters 2006-09, Vol.89 (9), p.093122-093122-3
Hauptverfasser: Klimovskaya, Alla I., Litvin, Yurii M., Moklyak, Yuliya Yu, Dadykin, Alex A., Kamins, Ted I., Sharma, Shashank
Format: Artikel
Sprache:eng
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Zusammenfassung:Dense ensembles of silicon nanowires were prepared by metal-catalyzed chemical vapor deposition on silicon substrates. Some of these ensembles were doped with phosphorus during growth. The nanowires were characterized using scanning electron microscopy, x-ray diffraction, and mass spectroscopy. Field emission of electrons from these structures was studied at room temperature in ultrahigh vacuum. The measurements were carried out using a parallel-plate diode cell. At high applied fields, the current-voltage characteristics deviate from the Fowler-Nordheim law and exhibit a stepwise increase of the current with increasing voltage at 300 K .
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2337279