Microwave plasma torch abatement of NF 3 and SF 6

An atmospheric pressure microwave plasma torch as a tool for fluorinated compounds (FCs) abatement was presented. Detailed experiments were conducted on the abatement of NF 3 and SF 6 in terms of destruction and removal efficiency (DRE) using Fourier transform infrared (FTIR). Swirl gas, compressed air for stable plasma, was tangentially injected into the microwave plasma torch and a mixture of N 2 , NF 3 , or SF 6 , and C 2 H 4 was axially injected. The DRE of 99.1% for NF 3 was achieved without an additive gas at the total flow rate of 50.1 liters per minute (lpm) by applying a microwave power of 1.4 kW . Also, a DRE of SF 6 up to 90.1% was obtained at the total flow rate of 40.6 lpm using an applied microwave power of 1.4 kW . Experimental results indicate that the microwave plasma abatement device can successfully eliminate FCs in the semiconductor industry.