Two-dimensional growth of continuous Cu 2 O thin filmsby magnetron sputtering

Two-dimensional growth of continuous Cu 2 O thin filmsby magnetron sputtering

We present results on the in situ , two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu 2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied...

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Veröffentlicht in:Applied physics letters 2005-01, Vol.86 (6), p.061901-061901-3
Hauptverfasser: Yin, Z. G., Zhang, H. T., Goodner, D. M., Bedzyk, M. J., Chang, R. P. H., Sun, Y., Ketterson, J. B.
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Zusammenfassung:We present results on the in situ , two-dimensional growth (as opposed to the more commonly encountered island-coalescence mechanism) of continuous epitaxial Cu 2 O films on MgO(011) using dc facing-magnetron sputtering from metallic Cu targets in an oxygen/argon atmosphere. Film growth was studied as a function of deposition time and the dc power applied to the guns. Control of the latter leads to either continuous or island-/rodlike film morphologies.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.1861117